EUV Mask (Photomask), Contains the microchip pattern to be projected, Specialized Mirrors, Focus and guide EUV light accurately onto the wafer, Photoresist-Coated Wafer, Receives light pattern, enabling the chemical image transfer, EUV Light Source, Emits extreme ultraviolet light at 13.5 nm wavelength, Pattern Development & Etching, Reveals and engraves the circuit design onto the wafer.

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